Method of manufacturing an IPS LCD device having a light shielding layer under at least one common or data electrodes so that light transmittance areas of the common and data electrodes are the same

ABSTRACT

The present invention relates to a method of manufacturing an in-plane switching mode LCD, in which data electrodes and common electrodes in a unit pixel have the same light transmitting area to reduce the luminance difference according to positive or negative polarity of an applied DC voltage, the method of manufacturing comprise preparing the first and second substrates; forming a plurality of gate lines and data lines on the first substrate to define a plurality of pixel areas; forming a plurality of data electrodes and the common electrodes to be alternately formed in each pixel area and having the same light transmitting area in applying voltage; and forming a liquid crystal layer between the first and second substrates.

CROSS-REFERERNCE TO RELATED APPLICATIONS

This application is a divisional of U.S. patent application Ser. No.11/647,285, filed Dec. 29, 2006, now U.S. Pat No. 7,522,245,now allowed,which is a divisional application of U.S. patent application Ser. No.:10/777,852, filed Feb. 13, 2004, now U.S. Pat. No. 7,173,682 which is adivisional of Ser. No. 09/892,879, now U.S. Pat. No. 6,724,454, filedJun. 28, 2001, which claims priority to Korean Patent application No.:P2000-61934, filed Oct. 20, 2000, all of which are incorporated byreference for all purposes as if fully set fourth herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an Liquid Crystal Display (LCD) Device,and more particularly, to an in-plane switching mode LCD and a method ofmanufacturing the same.

2. Discussion of the Related Art

Twisted Nematic (TN) mode LCDs are generally used in current LCDdevices. In the TN technique, electrodes are installed on each of twosubstrates and a liquid crystal (LC) director is arranged as a twisted90°, then voltage is applied to the electrodes to drive the LC director.

However, TN mode LCDs have the disadvantage that the phase of lightpassing through the liquid crystal cell varies according to thedirection of the light, causing a narrow viewing angle.

Recently, techniques have been actively developed for solving such aproblem of the narrow viewing angle. Techniques for widening the viewingangle include a film-compensated mode for compensating the viewing anglewith a compensating film, a multi-domain mode for dividing one pixelinto several domains to vary the main viewing angle direction of eachdomain so that the pixel characteristic becomes the mean value of theseveral domain characteristics; an in-plane switching mode for applyinga parallel electric field to twist the LC director in a plane parallelto an orientation film; a Vertical Alignment (VA) mode for using anegative liquid crystal and a vertically oriented film to verticallyarrange the long axis of liquid crystal molecules about the orientedfilm; an Optically Compensated Birefringence (OCB) mode, and the like.

In the in-plane switching mode LCD, two electrodes are formed on onesubstrate for rotating the liquid crystal molecules in a plane parallelto the substrate. Voltage is applied between the two electrodes toinduce an electric field parallel to the substrate, thereby reducingvariation in birefringence of the liquid crystal.

Therefore, the in-plane switching mode LCD has excellent viewing anglecharacteristics compared to the TN mode LCD of the related art.

Hereinafter the in-plane switching mode LCD of the related art will bedescribed with reference to the appended drawings as follows:

FIG. 1A is a plan view showing an in-plane switching mode LCD of therelated art. FIG. 1B shows a cross section along line I-I′ in FIG. 1A,and FIG. 1C shows a cross section along line II-II′ in FIG. 1A.

FIG. 2A is a plan view for showing a general structure of an ITO-ITOelectrode of the in-plane switching LCD. FIG. 2B shows transmitting andshielding areas of the ITO-ITO electrode of the in-plane switching LCDwhen positive DC voltage is applied to a data electrode. FIG. 2C showsthe transmitting and shielding areas of the ITO-ITO electrode of thein-plane switching LCD when negative DC voltage is applied to the dataelectrode.

The general in-plane switching mode LCD as shown in FIG. 1A comprisesdata lines 10 and gate lines 11 arranged on a first substrate fordefining a pixel area, a common line 12 arranged in the pixel areaparallel to the gate lines 11, a thin film transistor placed inintersecting regions of the gate lines 11 and the data lines 10, dataelectrodes 14 arranged parallel to the data lines 10 in the pixels,common electrodes 13 extended from the common lines 12 and arrangedbetween the data electrodes 14, and storage electrodes 55 extended fromthe data electrodes 14 and formed in the upper parts of the gate lines11.

Referring also to FIG. 1B, the in-plane switching mode LCD is formed byjoining the first substrate 18 and the second substrate 19 together inopposition to each other and injecting a liquid crystal layer 30 betweenthe two substrates. The gate lines 11 are formed parallel to the commonlines 12 on the first substrate 18. The common electrodes 13, whichextend from the common lines 12, are commonly formed with the commonlines 12. Here, a portion of the gate lines 11 functions as gateelectrodes of the thin film transistor.

Then, a silicon nitride (SiNx) or a silicon oxide (SiOx) film is appliedto the surface, including the gate lines 11 and the common electrodes13, to form a gate insulation film 20, and a semiconductor layer 15 isformed on a portion of the gate insulation film as an active layer.

Next, the data lines 10 are formed on top of the gate insulation film 20to form a matrix shape with the gate lines 11, and source/drainelectrodes 16 and 17 are simultaneously formed to extend from the datalines 10 and be placed on a semiconductor layer 15. Here, the dataelectrodes 14 parallel to the common electrodes 13 and the storageelectrodes 55 are formed at the same time, which connect the dataelectrodes 14.

The gate electrodes, the gate insulation film 20, the semiconductorlayer 15, the source/drain electrodes 16 and 17 form the thin filmtransistor.

Then, a silicon oxide film, a silicon nitride film or an organicinsulation film such as a BCB (Benzocyclobutene) film is applied on thesurface, including the data lines 10, to form a protective film 25.

In the in-plane switching LCD, the common electrodes and the dataelectrodes can be formed on different planes, with the insulation filmsandwiched as above or can be formed on one plane.

Also, the common electrodes and the data electrodes can be formedsimultaneously with the lines made of metals including Cu, Al, Cr, Mo,Ti, Al alloy and the like for shielding a light, or a transparentconductive material such as ITO (Indium Tin Oxide) can be used informing the same by further using a mask. When forming the electrodesusing a mask, however, care should be used to avoid a short between thelines or electrodes.

When the data electrodes 14 and the common electrodes 13 are formed ofITO, which is a transparent conductive film that is excellent intransmitting light, the LCD is called an ITO ITO in-plane switching LCD.A general structure of an ITO-ITO electrode is shown in FIG. 2.

A black matrix 21 is formed on the second substrate 19 to prevent lightleakage, and an R, G, B color filter layer 22 is formed between theblack matrix 21.

An overcoat layer 23 is formed on top of the color filter layer 22 toprotect and planarize the color filter layer 22.

The ITO-ITO in-plane switching LCD formed as above has a horizontal orparallel electric field rather than a vertical electric field betweenthe data and common electrodes, a vertical electric field in a middleportion of the electrodes, and horizontal or parallel and verticalelectric fields commonly formed at corners of the electrodes.

Initially, the liquid crystal molecules between the electrodes arerotated parallel to the substrate due to a side electric field. After acertain time period, the liquid crystal molecules on the electrodes arerotated due to the vertical and side electric fields and an elasticforce of the liquid crystal at the electrodes.

In an ITO-ITO in-plane switching LCD, the liquid crystal molecules onthe electrodes have an orientation according to positive or negativevoltage applied to the electrodes, thereby causing light transmissivityto be different at the data electrodes and the common electrodes.

In other words, when a positive DC voltage is applied to the dataelectrodes and a negative DC voltage is applied to the commonelectrodes, light is transmitted in a larger amount at the commonelectrodes than at the data electrodes, as shown in FIG. 2B. Also, whena negative DC voltage is applied to the data electrodes and a positiveDC voltage is applied to the common electrodes, light is transmitted ina larger amount at the data electrodes 14, as shown in FIG. 2C.

In other words, a luminance difference is created at each electrodedepending on whether a positive or negative voltage is applied.

As shown herein before, the foregoing in-plane switching LCD of therelated art has the following problems.

To reduce degradation due to malfunction of the liquid crystal and toimprove definition (picture quality), the common electrodes at theoutermost position in the pixels are opposed and shielded with the blackmatrix layer on the substrate. Thus, the common electrodes and the dataelectrodes in a unit pixel have different the transmitting areas, whichcauses a luminance difference according to positively or negativelyapplied voltage. Flickers and residual images are generated because ofthe luminance difference, thus lowering reliability of the displaydevice.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to an in-plane switchingmode liquid crystal display device and method of manufacturing the samethat substantially obviates one or more of the problems due tolimitations and disadvantages of the related art.

It is therefore an object of the invention to provide an in-planeswitching mode LCD in which the light transmitting area the same withrespect to data electrodes and common electrodes to improve definition(picture quality), and a manufacturing method thereof.

Additional features and advantages of the invention will be set forth inthe description which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof as well as the appended drawings.

To achieve these and other advantages in accordance with the purpose ofthe present invention, as embodied, and broadly described, An in-planeswitching liquid crystal display device, comprises first and secondsubstrates; a plurality of data lines on the first substrate; aplurality of gate lines crossing the data lines on the first substrate,perpendicular to the data lines; a plurality of pixel areas on saidfirst substrate defined by the data and gate lines; data electrodes andcommon electrodes alternately formed in each of said pixel areas, thedata electrodes having a first transmittance area and the commonelectrodes having a second transmittance area, wherein the firsttransmittance area equals the second transmittance area; and a liquidcrystal layer between said first and second substrates.

In another aspect of the present invention, an in-plane switching modeLCD comprises: first and second substrates; a plurality of pixel areason the first substrate; data electrodes and common electrodesalternately formed in each of the pixel areas and patterned to have thesame light transmitting area according to applied voltage; and a liquidcrystal layer between the first and second substrates.

In another aspect of the present invention, a method of manufacturing anin-plane switching mode LCD includes the preparing the first and secondsubstrates; forming a plurality of gate lines and data lines on thefirst substrate to define a plurality of pixel areas; forming aplurality of data electrodes and common electrodes to be alternatelyformed in each pixel and have the same light transmitting area inapplying voltage; and forming a liquid crystal layer between the firstand second substrates.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principles of theinvention.

In the drawings:

FIG. 1A is a plan view an in-plane driving mode LCD of the related art;

FIG. 1B shows a cross section along a line I-r of FIG. 1A;

FIG. 1C shows a cross section along a line II-II of FIG. 1A.

FIG. 2A is a plan view for showing a general structure of an ITO-TOelectrode of the in-plane switching LCD;

FIG. 2B shows transmitting and shielding areas when a positive DCvoltage is applied to a data electrode;

FIG. 2C shows the transmitting and shielding areas when a negative DCvoltage is applied to the data electrode;

FIG. 3A is a plan view of an embodiment of an in-plane switching modeLCD of the present invention;

FIG. 3B shows a cross section along a line III-III′ of FIG. 3A;

FIG. 4A shows a cross section of a main part of an in-plane switchingmode LCD according to a first embodiment of the present invention;

FIG. 4B shows a cross section of a main part of an in-plane switchingmode LCD according to a second embodiment of the present invention;

FIG. 4C shows a cross section of a main part of an in-plane switchingmode LCD according to a third embodiment of the present invention;

FIG. 5 shows a screen on a display according to one of the first tofourth embodiments of the present invention;

FIGS. 6A and 6B show a cross sections of a main part of an in-planeswitching mode LCD according to the fifth embodiment of the presentinvention;

FIGS. 7A and 7B show a cross sections of a main part of an in-planeswitching mode LCD according to the sixth embodiment of the presentinvention;

FIGS. 8A and 8B shows a cross section of a main part of an in-planeswitching mode LCD according to the seventh embodiment of the presentinvention; and

FIG. 9 shows a screen on a display according to one of the fifth toseventh embodiments of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Reference will now be made in detail to the preferred embodiment of thepresent invention, example of which is illustrated in the accompanyingdrawings.

FIG. 3A is a plan view showing an in-plane switching mode LCD of thepresent invention, and FIG. 3B shows a cross section along line III-III′in FIG. 3A.

FIG. 4A shows a cross section of a main part of an in-plane switchingmode LCD according to the first embodiment of the present invention.FIG. 4B shows a cross section of a main part of an in-plane switchingmode LCD according to the second embodiment of the present invention.FIG. 4C shows a cross section of a main part of an in-plane switchingmode LCD according to the third embodiment of the present invention.

FIG. 5 shows a screen on a display according to one of the first tofourth embodiments of the invention.

First, explaining the method of manufacturing the in-plane switchingmode LCD according to the first embodiment in reference to FIG. 3A toFIG. 3B, a low resistance metal layer is deposited and patterned to formgate lines 111 and a gate electrode 111 a, which extends from the gatelines 111 and is the gate electrode of a thin film transistor.

Then, a silicon nitride (SiNx) or a silicon oxide (SiOx) film isdeposited on the surface of the gate lines 111 to form a gate insulationfilm 120, and a semiconductor layer 115 is formed on the gate insulationfilm 120 over the gate electrodes 111 a using amorphous silicon.

Then, a low resistance metal is deposited on the gate insulation film120 followed and patterned to form data lines 110 in a matrix with thegate lines 111, so that data lines 110 together with the gate linesdefine a unit pixel area.

Here, source/drain electrodes 116 and 117 of a thin film transistor areformed simultaneously with the data lines 110.

Here, the gate electrodes, gate insulation film, semiconductor layer,source/drain electrodes from the thin film transistor.

Then, as shown in FIG. 4A, shielding layers 215 b are formed under aposition where the outermost ones of common electrodes 213 in a unitpixel will be formed later. A shielding layer 215 a is formed under aposition where one of the data electrodes 214 in the unit pixel will beformed later, so that the common electrodes and the data electrodes inthe unit pixel have the same light transmitting area.

The data lines are formed of metals including Cu, Al, Cr, Mo, Ti, Alalloy and the like for shielding light, therefore an additional processis not necessary to form shielding layers 215 a and 215 b under thecommon electrodes and the data electrodes.

Here, the outermost common electrodes in the unit pixel are shielded toreduce the influence of the electric field at both ends in the unitpixel about the liquid crystal, where the behavior of the liquid crystalis unclear when voltage is applied. Because the electric field betweenthe outermost common electrode and an adjacent unit pixel data line isunknown, the outermost common electrode is shielded by a black matrix.In addition instead of being formed of ITO, the outermost commonelectrodes can be formed of an opaque metal that can shield light.Alternatively, the black matrix on the second substrate can be extendedto the area of the outermost common electrodes.

Then, the plurality of data electrodes 214 are formed and areelectrically connected with the drain electrode 117 and parallel to thedata lines; and the common electrodes 213 are formed at the positionscorresponding to positions between the data electrodes 214. That is, thedata electrodes 214 and the common electrodes 213 have an alternatingpattern.

Here, the common electrodes 213 can be formed under the data electrodes214, i.e., on a layer different from the data electrodes 214 as shown inFIG. 4B. Alternatively the common electrodes 213 can be formed with thedata electrodes, i.e., on the same layer as the data electrode 214 asshown in FIG. 4C.

Referring again to FIG. 3B, meanwhile, a black matrix 121 is formed onthe second substrate 119 for preventing leakage of light, and a colorfilter layer 122 is formed between the black matrix 121.

Finally, the first substrate 118 and the second substrate 119 areassembled to oppose each other, and a liquid crystal layer 130 isinjected between the substrates 118 and 119 to complete the in-planeswitching mode LCD.

Here, the data electrodes 214 and the common electrodes 213 are formedof ITO which is a transparent conductive film excellent in transmittinglight.

In such an in-plane switching mode LCD of the invention, the lighttransmitting area through the data electrodes and the light transmittingarea through the common electrodes are the same even if the outermostcommon electrodes in the unit pixel are shielded, so that the luminancedifference due to a positive or negative applied DC voltage isprevented.

Meanwhile, as the fourth embodiment of the invention, the outermostcommon electrodes in the unit pixel can be formed of a shielding metalcapable of shielding a light instead of the transparent conductive film.In this case, it is unnecessary to form an additional shielding layer orto extend the black matrix.

The first to fourth embodiments of the invention, as discussed above,have the alternating common electrodes 213 and data electrodes 214 inthe unit pixel area. At least one data electrode 214 a of the dataelectrodes in the unit pixel is shielded to make the common electrodeshave the same light transmitting area as the data electrodes, so thatthe difference between the light transmitting areas of the commonelectrodes and the data electrodes occurring when the outermost commonelectrodes 213 a are shielded as shown in FIG. 5.

Meanwhile, FIGS. 6A and 6B show a cross sections of a main part of anin-plane switching mode LCD according to the fifth embodiment of theinvention. FIGS. 7A and 7B show a cross section of a main part accordingto the sixth embodiment of the invention. FIGS. 8A and 8B show a crosssection of a main part of an in-plane switching mode LCD according tothe seventh embodiment of the invention, in which width of at least onecommon electrode is patterned wider than that of data electrodes.

In other words, instead of one of the data electrodes being shieldedaccording to the first to fourth embodiments of the present invention,one of the common electrodes is formed wider in width than the dataelectrodes of the fifth to seventh embodiments of the present invention,so that the common electrodes and the data electrodes have the samelight transmitting area. For example, one common electrode can be formedto be twice the width of one of the data electrodes, so that, e.g., twocommon electrodes that transmit light can have the same area as threedata electrodes that transmit light. Alternatively, two commonelectrodes can be formed to be 1.5 times the width of one of the dataelectrodes, so that, e.g., two common electrodes can have the same areaas three data electrodes.

As not shown in the drawings, gate lines and gate electrodes are formedon the first substrate. A gate insulation film is formed on the surfaceincluding the gate lines. Then, the semiconductor layer is formed on thegate insulation film on the gate electrodes.

Then, data lines are formed on the gate insulation film to form a matrixwith the gate lines to define unit pixel areas. Source and drainelectrodes are formed at the same time as the data lines.

Here, the gate electrodes, gate insulation film, semiconductor layer,source and drain electrodes form the thin film transistor.

Consequently, when the data lines are formed, a plurality of dataelectrodes 314 are formed to be electrically connected with the drainelectrode and parallel to the data lines and the common electrodes 313 aand 313 b. Shielding layers 315 b are formed of the same material asthat of the data lines to be under some outermost ones of a pluralitycommon electrodes 313 a and 313 b which will be formed later. The commonelectrodes 313 a and 313 b alternate with the data electrodes 314. Atleast one of the plurality of common electrodes is formed wider in widththan that of the adjacent data electrode.

For example, when the common electrodes and the data electrodes havesubstantially the same width and the number of the data electrodes isone more than that of the common electrodes, one of the commonelectrodes is formed to have two times the width of the data lines, sothat the common electrodes and the data electrodes have the same lighttransmitting area overall.

Here, an insulation film 325, on which the data electrodes 314 can beformed, may be formed on the surface including the common electrodes 313a and 313 b as shown in FIG. 6B, and the common electrodes 313 a and 313b can be formed with the data electrodes 314.

Meanwhile, a black matrix is formed on the second substrate forpreventing light leakage, and a color filter layer is formed in theblack matrix as not shown in the drawings.

Finally, the first and second substrates are assembled to oppose eachother, and a liquid crystal layer is injected between the two substratesto complete the in-plane switching mode LCD.

Here, the data electrodes 314 and the common electrodes 313 are ITO,except that the outermost common electrodes, shown in FIG. 6A to FIG.6C, can be formed of a shielding metal which can shield light.

According to the fifth to seventh embodiments of the present inventionas described herein before, the common electrodes are patterned widerthan the data electrodes so that the common electrodes and the dataelectrodes have the same light transmitting area, as shown in FIG. 9.

The non-shielded area of the common electrodes is smaller than the areaof the data electrodes because the outermost common electrodes areshielded. Thus, according to the present invention the common electrodesare patterned wider to have the same area as the data electrodes.

In reference, the data electrodes and the common electrodes can beformed in various forms such as a zigzag type instead of a stripe type.

Such a method of manufacturing the in-plane switching mode LCD accordingto the invention has the following effects:

First, the data electrodes and the common electrodes in the unit pixelhave the same light transmitting area to eliminate the luminancedifference caused by positive or negative DC voltage, thereby improvingthe problem of flickers and residual images caused by the luminancedifference. Therefore, image quality and reliability of the display isenhanced.

Second, the process of shielding the common electrodes and the dataelectrodes are carried out at the same time as the data line or gateline forming process so that the overall process can be simplified,thereby minimizing process time.

It will be apparent to those skilled in the art that variousmodifications and variation can be made in the present invention withoutdeparting from the spirit or scope of the invention. Thus, it isintended that the present invention cover the modifications andvariations of this invention provided they come within the scope of theappended claims and their equivalents.

1. A method of manufacturing an in-plane switching liquid crystal display device comprising: preparing the first and second substrates; forming a plurality of gate lines on the first substrate; forming an insulation film over a surface of the pixel area including the gate lines; forming the data lines and light shielding layers each having a predetermined width on the insulation film; forming a first protective film on the surface including the light shielding layers; forming a plurality of common electrodes on the first protective film; forming a second protective film on the surface including the common electrodes; forming a plurality of data electrodes on the second protective film, the data electrodes and the common electrodes to be alternately formed in each pixel area and having the same light transmitting area; and forming a liquid crystal layer between the first and second substrates, wherein each outer most common electrode of the plurality of common electrodes in the unit pixel is substantially vertically aligned with each of the light shielding layers and each of the data electrodes is formed in each area between two adjacent common electrodes.
 2. The method of claim 1, further comprising another light shielding layer under one data electrode, wherein the light shielding layers and another light shielding layer are formed together and same time with the data lines.
 3. The method of claim 2, wherein the light shielding layers are formed of the same material as the data lines.
 4. The method of claim 1, wherein said light shielding layers are formed of the same material as the data lines.
 5. A method of manufacturing an in-plane switching liquid crystal display device comprising: preparing the first substrate; forming an insulation film over the first substrate including gate lines; forming light shielding layers having a predetermined width over the first substrate and; forming a first protective film over the first substrate including the shielding layers; forming common electrodes on the first protective film; forming a second protective film on the surface including the common electrodes; forming a plurality of data electrodes on the second protective film, the data electrodes and the common electrodes to be alternately formed in an unit pixel area, the plurality of data electrodes and common electrodes having the same light transmitting area, and wherein the light shielding layer is formed under outer most ones of the common electrodes and wherein each outer most common electrode of the plurality of common electrodes in the unit pixel is substantially vertically aligned with each of the shielding layers.
 6. The method of claim 5, further comprising: forming data lines on the insulation film when the shielding layer is formed; preparing a second substrate; and forming a liquid crystal layer between the first and second substrates.
 7. The method of claim 5, further comprising another light shielding layer under one data electrode, wherein the light shielding layers and another light shielding layer are formed together and same time with the data lines.
 8. The method of claim 6, wherein said light shielding layers are formed of the same material as the data lines.
 9. The method of claim 5, wherein each of the data electrodes are deposed between the common electrodes and parallel with the common electrodes. 